分子结构:
CCD编号:CCD03477857
FACTOR VIIA SUBSTRATE
分子式:C31 H44 F3 N7 O7 S
分子量:715.791
* If the product has intellectual property rights, a license granted is must or contact us.
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| 产品名称： | FACTOR VIIA SUBSTRATE |
| 英文同义词： | MESO2-CHA-ABU-ARG-AFC ; FACTOR VIIA SUBSTRATE ; METHYLSULFONYL-D-CHA-ABU-ARG-7-AMINO-4(TRIFLUOROMETHYL)-COUMARIDE ; SUBSTRATE FOR FACTOR VIIA |
| MDL号： | MFCD17215334 |
| 氢键受体数量： | 14 |
| 氢键供体数量： | 7 |
| Smile： | CCC[C@@H](C(=O)N[C@@H](CCCNC(=N)N)C(=O)Nc1ccc2c(cc(=O)oc2c1)C(F)(F)F)NC(=O)[C@@H](CC3CCCCC3)NS(=O)(=O)C |
| InChi： | InChI=1S/C31H44F3N7O7S/c1-3-8-22(39-29(45)24(41-49(2,46)47)15-18-9-5-4-6-10-18)28(44)40-23(11-7-14-37-30(35)36)27(43)38-19-12-13-20-21(31(32,33)34)17-26(42)48-25(20)16-19/h12-13,16-18,22-24,41H,3-11,14-15H2,1-2H3,(H,38,43)(H,39,45)(H,40,44)(H4,35,36,37)/t22-,23-,24+/m0/s1 |
| InChiKey： | InChIKey=MRPIQBVNFFNTIQ-KMDXXIMOSA-N |
基本信息
* If the product has intellectual property rights, a license granted is must or contact us.
