searchResult

CCD:CCD00048002

CAS:12047-11-9;11138-11-7

MDL:MFCD00075637

MF / MW:Ba O . 6 Fe2 O3 / 1111.45

Synonyms:铁酸盐钡;纳米钡铁氧体,30-50NM 球形 99.5%;纳米钡铁氧体;BARIUM FERRATE;钡铁氧体;BARIUM DODECAIRON NONADECAOXIDE;BARIUM IRON OXIDE;BARIUM FERRITE;纳米钡铁氧体,200NM,99%

CCD:CCD00010720

CAS:12060-58-1;13569-60-3

MDL:MFCD00011237

MF / MW:O3 Sm2 / 348.717

Synonyms:氧化钐;纳米氧化钐,40NM,99.5% METALS BASIS;氧化钐/纳米氧化钐;SAMARIUM OXIDE;SAMARIA;SAMARIUM(III) OXIDE;氧化钐,99.99% METALS BASIS;纳米氧化钐;高氯酸钐

CCD:CCD00003334

CAS:1333-84-2;1302-74-5;11092-32-3;1344-28-1;68389-42-4

MDL:MFCD00003424

MF / MW:Al2 O3 / 101.961

Synonyms:氧化铝,SP,99.999%;ALUMINUM OXIDE (GAMMA MOD);ALUMINA, NEUTRAL (ACTIVE);NANODUR(TM) X1130PMA;ALUMINIUM OXIDE, WEAKLY ACIDIC, BROCKMANN I;ALUMINA, ACTIVATED, ACIDIC, BROCKMANN I;ALUMINUM OXIDE FIBER;ALUMINA A-TLC;氧化铝,AR;ALUMINIUM OXIDE, NEUTRAL, BROCKMANN I;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘1-3MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALPHA ALUMINIUM OXIDE;GAMMA-ALUMINUM (III) OXIDE;ALUMINUM OXIDE;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE R PLANE;高纯超细氧化铝,4N,晶型Α,Θ;ALUMINA N 32-63;ALUMINA, ACTIVATED, NEUTRAL, BROCKMANN I;ALIMINUM OXIDE BASIC A;ACTIVATED ALUMINA;NANOARC(R) AL-2220;ALUMINA DCC;ALUMINUM OXIDE, GAMMA-BETA;ALUMINUM OXIDE ON TLC ALU FOILS;ALUMINUM OXIDE POLISHING POWDER, NANOMETER GRADE;ALUNDUM;氧化铝,99.99% METALS BASIS ,5～6ΜM,粉末;FUSED ALUMINA;ALUMINUM OXIDE, NANOTEK(R);ALUMINIUM OXIDE 60 G NEUTRAL (TYPE E);RUBY;ALUMINUM OXIDE, SINGLE CRYSTAL 99.9% (METALS BASIS);ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES R PLANE;ALUMINUM OXIDE, BASIC FOR CHROMATOGRAPHY 200MESH;NANOTEK(R) AL-6081;ALUMINIUM OXIDES-TLC;ALUMINA;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 10±0.5 % AS AL2O3 PH 6－7 10-100 MPA·S;ALUMINIUM OXIDE 150 BASIC;ALUMINUM OXIDE, ALPHA-BETA;ALUMINUM OXIDE, ACIDIC ACTIVITY: SUPER I FOR CHROMATOGRAPHY;ALUMINIUM OXIDE,BASIC;ALUMINA N 3-6;ALUMINUM OXIDE, NEUTRAL ACTIVITY: SUPER I FOR CHROMATOGRAPHY;水合氧化铝;ALUMINA, ACTIVATED;ALUMINUM OXIDE, PELLET DIA. 30MM HEIGHT 30MM;ALUMINUM OXIDE, CATALYST SUPPORT HIGH SURFACE AREA 1 4" RINGS;NANODUR(TM) X1121W;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 18－20 % AS AL2O3 PH 6－7 30-200 MPA·S;ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES M PLANE;ALUMINIUM OXIDE,ACTIVE;ALUMINA, NEUTRAL, BROCKMAN ACTIVITY I;纳米氧化铝,99%,Γ相,20NM;氧化铝;ALUMINUM OXIDE, ACTIVATED, ACIDIC, BROCKMANN I;ALUMINUM OXIDE, BETA;ALUMINUM OXIDE, ALPHA 99.99% (METALS BASIS) 0.5-2.5 MICRON;ALUMINUM OXIDE 60 G;ALUMINUM OXIDE, BASIC ACTIVITY: SUPER I FOR CHROMATOGRAPHY;ALUMINUM OXIDE, CATALYST SUPPORT INTERMEDIATE SURFACE AREA;ALUMINUM OXIDE, NANODUR;ALUMINIUM OXIDE, NEUTRAL, BROCKMANN TYPE I;ALUMINA N 10-18;纳米氧化铝醇分散液,30 NM 粒径, 20 WT. % 异丙醇溶液;ALUMINA, CRUCIBLE, TALL FORM, W/LID, 50ML;ALUMINUM OXIDE, ACTIVATED, NEUTRAL, BROCKMANN GRADE II;中性氧化铝;ALUMINUM OXIDE, TARGET 99.99%;ALUMINUM OXIDE,ACTIVATED, DEUTERATED;ALUMINA C;氧化铝陶瓷;氧化铝球;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 18－20 % AS AL2O3 PH 4－4.5 30-200 MPA·S;ALUMINUM OXIDE ON TLC-PLATES;ALUMINA N-TLC;ALUMINIUM OXIDE (ALPHA TYPE);ALUMINUM OXIDE, ACIDIC GR;GAMMA-ALUMINIA;ALUMINIUM OXIDE;ALUMINA G-TLC;ALUMINA N;ALUMINA I;ALUMINA, ACTIVATED, BASIC, BROCKMANN I;ALUMINUM OXIDE, ACTIVATED, NEUTRAL;氧化铝棉;TLC CARDS ALUMINIUM OXIDE;ALUNDUM RR;ALUMINUM OXIDE, ALPHA 99.95% (METALS BASIS) 0.8 MICRON POWDER;纳米氧化铝水分散液;ACTIVATED ALUMINA FOR DESICCANT;ALUMINUM OXIDE BASIC A;碱性氧化铝,200-300目;ALUMINUM OXIDE, G NEUTRAL FOR TLC;ALUMINUM OXIDE, ALPHA 99.999% (METALS BASIS) 10-20 MICRON POWDER;ALUMINA, BASIC, BROCKMAN ACTIVITY I;ALUMINUM OXIDE 90 ACTIVE;ALUMINUM TRIOXIDE;ALUMINA, ACIDIC, BROCKMANN I;INHIBITOR REMOVER;ALUMINIUM OXIDE 90, ACTIVE BASIC;ALUMINUM OXIDE, 90 STANDARDISED (0.063-0.200MM)(ACTIVITY STAGE II-III FOR CHROMATOGRAPHY ADSORPTION ANALYSIS ACC TO BROCKMANN;ALUMINIUM OXIDE 60GF254;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘3-4MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;Α相纳米氧化铝分散浆;ANALTECH TLC UNIPLATES(TM): ALUMINA MATRIX;ALUMINIUM OXIDE 90;ALUSPHER(R);氧化铝G;ALUMINUM OXIDE, ALPHA 99.98% 12-18UM HEXAGONAL LAMELLAR OR ELLIPSOID;ALUMINA B 18-32;ALUMINUM (III) OXIDE;ALUMINA, ACID, BROCKMAN ACTIVITY I;ALUMINUM OXIDE, 60 G NEUTRAL (TYPE E) FOR THIN LAYER CHROMATOGRAPHY;ALUMINA N 18-32;GEDURAN(R) AL 90;纳米氧化铝,99.99% METALS BASIS,Α相,30NM;ALUMINUM OXIDE, GAMMA-PHASE, ALPHA-PHASE;ALUMINUM OXIDE, R FOR CHROMATOGRAPHY;氧化铝,0.7-1.6MM,元素分析仪专用;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 14－15 % AS AL2O3 PH 6－7 30-200 MPA·S;ANTI-BUMPING GRANULES FUSED ALUMINA;ALUMINUM OXIDE, 60 GF254 NEUTRAL (TYPE E) FOR THIN LAYER CHROMATOGRAPHY;GAMMA-ALUMINA, LOW SODA;ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES A PLANE;ALUMINIUM OXIDE NEUTRAL;ALUMINIUM OXIDE, ACID, BROCKMANN TYPE I;ALUMINUM OXIDE, SUBSTRATE POLISHED TWO SIDES C PLANE;ALUMINA A 18-32;Γ-氧化铝;中性氧化铝,200-300目;ALUMINIUM OXIDE, ACTIVATED;ALUMINUM OXIDE, ACIDIC;ALUMINUM OXIDE, BETA, 99.99%;ALUMINUM OXIDE, ACTIVE MICROBALL 30-200 MESH FOR DESICCATION & CATALYSATION;ALUMINUM OXIDE, 99.99+% BELOW 0.5UM NANOMETER SIZE;Α相纳米氧化铝分散浆,Α相,30 NM 粒径, 20 WT. % 水溶液;氧化铝,99.99% METALS BASIS,晶型Α,0.20ΜM;NANODUR(R) AL-2420;ALUMINUM OXIDE, ACID;ALUMINA B-TLC;BOILING STONES;ALUMINA ACTIVATED 200;氧化铝,99.99% METALS BASIS,Α晶型约95%,晶型Γ约5%,80NM;ALUMINUM OXIDE, ACTIVATED, GAMMA;ALUMINUM OXIDE, C FOR CHROMATOGRAPHY;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE C PLANE;ALUMINUM OXIDE, BASIC FOR TLC;BOILING STONE;RIDOX OXYGEN SCAVENGER;ALUMINUM OXIDE, RP C18 FOR LUQUID CHROMATOGRAPHY;ALUMINA N TYPE I;ALUMINIUM OXIDE 60;低比表面积标准物质;ALUMINIUM OXIDE BASIC;ALUMINUM OXIDE, ACTIVATED, GAMMA, BASIC;ALUMINUM OXIDE, CALCINED 1-2 UM 99+%;ALUMINUM OXIDE, ALPHA 99.98% 3-6UM HEXAGONAL LAMELLAR OR ELLIPSOID;ALUMINUM OXIDE, POLYMERIC PRECURSOR;ALUMINUM OXIDE, GAMMA;ALUMINA, ACTIVATED, BASIC;ALUMINUM OXIDE, NEUTRAL;ALUMINIUM OXIDES-PLC;ALUMINUM OXIDE 60 GF254;CORUNDUM;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 18 % AS AL2O3 PH 4－4.5 500 MPA·S;ALUMINUM OXIDE, 99+% INSULATING POWDER;ALUMINUM OXIDE, NEUTRAL 75-300 MESH ACTIVITY: I FOR CHROMATOGRAPHY;ALUMINA ACTIVATED 300;纳米级氧化铝,99.99% METALS BASIS,晶型Γ,20NM;BOILEEZERS GRANULES;ALUMINUM OXIDE, GAMMA-ALPHA 99.99% (METALS BASIS);ALUMINUM OXIDE, CALCINED, GR 99+%;NANOTEK(R) AL-6051;介孔三氧化二铝比表面积、总孔容及孔径标准物质;ALUMINUM OXIDE ON TLC-GLASS PLATES;ALUMINA, NEUTRAL, BROCKMANN I;纳米氧化铝,99.9% METALS BASIS,Α相,30NM,亲油型;ALUMINIUM OXIDE, BASIC, BROCKMANN I;ALUMINUM OXIDE, ALPHA;ALUMINUM OXIDE, DCC FOR CHROMATOGRAPHY;ALUMINUM OXIDE, ALPHA 99.99% (METALS BASIS);酸性氧化铝,100-200目;纳米氧化铝;ALUMINUM OXIDE 90;ALUMINA A;ALUMINUM OXIDE, MESOPOROUS;ALUMINUM OXIDE, GAMMA-PHASE;纳米氧化铝醇分散液;ALUMINUM OXIDE, ACTIVE;纳米级氧化铝;ALUMINUM OXIDE, SUPER ACTIVATED, ACIDIC;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE A PLANE;氧化铝G,TLC专用;碱性氧化铝,100-200目;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘F10X3MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 9±0.5 % AS AL2O3 PH 4－4.5 30 MPA·S;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘5-7MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALUMINIUM OXIDE 60 GF254 NEUTRAL (TYPE E);ALUMINUM OXIDE, 99.995% BELOW 0.5UM NANOMETER SIZE;ALUMINUM OXIDE, 98+% EXTRA PURE;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 14－15 % AS AL2O3 PH 4－4.5 30-200 MPA·S;高纯超细氧化铝;ALUMINA A ACTIVITY I;ALUMINUM OXIDE, BASIC;ALUMINA TYPE II-III;ALUMINUM OXIDE, ALPHA-PHASE;ALUMINIUM OXIDE, ACIDIC, BROCKMANN I;ALUMINUM OXIDE, ACTIVATED CATALYST SUPPORT 99% (METALS BASIS);ALUMINA, ADSORPTION;NANOARC(R) R1130PMA;ALUMINUM OXIDE, ACTIVATED, ACIDIC;ALUMINUM OXIDE, NEUTRAL 200-300 MESH GR;ALUMINUM OXIDE, ANHYDROUS DESICCANT;ALUMINUM OXIDE, ALPHA-PHASE, GAMMA-PHASE;ALUMINUM OXIDE, COLLOIDAL SOLID TPYE 18+% COLLOID 60+% SOLID;NANOARC(R) R1121W;ALUMINA, NEUTRAL;活性氧化铝,80-100目 GC;RONAFLAIR(TM) WHITE SAPPHIRE;SAPPHIRE;GAMMA-ALUMINA;ALUMINUM OXIDE, NEUTRAL 100-200 MESH GR;碱性氧化铝;ALUMINIUM OXIDE, BASIC, BROCKMANN TYPE II;ALUMINUM OXIDE, ALPHA 99.9% (METALS BASIS) 20 MICRON POWDER;ALUMINUM OXIDE 60;ALUMINUM OXIDE, ALPHA 99.98% 6-12UM HEXAGONAL LAMELLAR OR ELLIPSOID;SPE AL-N(ALUMINA);ALUMINA B TYPE I;ALUMINIUM OXIDE ACIDIC;ALUMINUM OXIDE G;GAMMA-ALUMINUM OXIDE;ALUMINUM OXIDE, GEL CARBONIZED ACTIVATED;纳米氧化铝水分散液,5-10 NM 粒径, 20 WT. % 水溶液;纳米氧化铝,99.99% METALS BASIS,Γ相,10NM;氧化铝,99.99% METALS BASIS,Α晶型约90%,晶型Γ约10%,50NM;氧化铝,200-300目;ALUMINA HYDRATE;ALUMINUM OXIDE, GAMMA-ALPHA;ALUMINUM OXIDE, ALPHA 99.98% 18-25UM HEXAGONAL LAMELLAR OR ELLIPSOID;ALUMINUM OXIDE, ACTIVATED, BASIC;ALUMINA B 32-63;ALUMINA,ACTIVATED;纳米氧化铝,99.9% METALS BASIS,Α相,30NM,亲水型;ALUMINIUM OXIDE, BASIC, BROCKMANN TYPE I;ALUMINUM OXIDE, ACTIVE GRANULAR 99+%;氧化铝,99．99%,镀膜;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE M PLANE;ALUMINUM OXIDE, ALPHA 99.99% (METALS BASIS) 10-15 MICRON;ALUMINUM OXIDE, CATALYST SUPPORT LOW SURFACE AREA;ALUMINUM OXIDE, ACIDIC 75-300 MESH ACTIVITY: I FOR CHROMATOGRAPHY;ALUMINA, CRUCIBLE, TALL FORM, W/LID, 100ML;ALUMINUM OXIDE, BASIC 75-300 MESH ACTIVITY: I FOR CHROMATOGRAPHY;活性氧化铝;三氧化二铝比表面积标准物质;AEROXIDE(R) ALU C;ALUMINUM OXIDE, PASTE;氧化铝棉,元素分析仪专用;ALUMINA A TYPE I;ALUMINUM OXIDE, ACTIVATED 350MESH;ALUMINUM OXIDE, BASIC 100-200 MESH GR;ALUMINA B;ALUMINUM OXIDE, ACTIVATED, NEUTRAL, GAMMA-PHASE;酸性氧化铝;ALUMINUM OXIDE, SUBSTRATE POLISHED ONE SIDE M PLANE;ALUMINUM OXIDE, 90 ACTIVE BASIC (0.063-0.200 MM) ACTIVITY S;ALUMINUM OXIDE, CATALYST SUPPORT INTERMEDIATE SURFACE AREA (LOW SIO );ALUMINUM OXIDE, ACTIVATED;ALUMINUM OXIDE/TLC-CARDS;ALPHA-ALUMINUM (III) OXIDE;ALUMINA N 7-12;中性氧化铝,100-200目;ALUMINUM OXIDE, SUPER ACTIVATED, BASIC;氧化铝,99.998% METALS BASIS ,块状;活性氧化铝,60-80目 GC;ALUMINUM OXIDE, (AL2O3) OPTICAL WINDOW‘0.8-1MM, 99.99%, 1.62NM'550, 200-5000NM, 2000-2200C;ALUMINUM OXIDE, COLLOIDAL LIQUID 60-100NM 10±0.5 % AS AL2O3 PH 4－4.5 10-100 MPA·S;ALPHA-ALUMINA;ALUMINIUM OXIDE 60G;活性氧化铝,40-60目 GC

CCD:CCD00010715

CAS:61790-53-2;7631-86-9;14808-60-7;63231-67-4;60676-86-0;112945-52-5;112926-00-8;68583-49-3;14464-46-1;68909-20-6;10279-57-9;1343-98-2;68855-54-9

MDL:MFCD00011232

MF / MW:O2 Si / 60.084

Synonyms:SILICA NANOSPRINGS COATED WITH ZINC OXIDE AND GROWN ON ALUMINUM FOIL SUBSTRATE (3.5 X 8CM);UNIFORM SILICA MICROSPHERES;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:2-3ΜM,单位:10MG/ML;SILICIC ANHYDRIDE;疏水型气相纳米二氧化硅HYDROPHOBIC-120型;SILICON(IV) OXIDE, FUMED;二氧化硅标准溶液;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:4-5ΜM,单位:10MG/ML;单分散二氧化硅微球,粒径:5.0ΜM,2.5% W/V;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:4-5ΜM,单位:10MG/ML;疏水气相纳米二氧化硅,99.8%,比表面积（BET）：230M2/G;疏水气相纳米二氧化硅HYDROPHOBIC-100型,99.8%,比表面积（BET）：100M2/G;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:1-2ΜM,单位:10MG/ML;二氧化硅,99.99% METALS BASIS,粒径:2ΜM;石英砂;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:2-3ΜM,单位:10MG/ML;SILICA GEL TEL-TALE DESICCANT, INDICATING;PHARMPREP(R) 60 CC;INFUSORIAL EARTH;DIOXOSILANE;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:3-4ΜM,单位10MG/ML;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:1-2ΜM,单位:10MG/ML;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:4-5ΜM,单位:10MG/ML;LUDOX(R) CL-X COLLOIDAL SILICA;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:3-4ΜM,单位:10MG/ML;SILICA GEL ON TLC ALU FOILS;CELITE(R);SEA SAND;二氧化硅标准溶液,1000ΜG/ML,介质：0.05MOL/L NAOH;硅酸;MAGNETIC PARTICLES EMBEDDED IN SIO2;纳米二氧化硅;介孔二氧化硅比表面积、总孔容及孔径标准物质;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:4-5ΜM,单位:10MG/ML;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:0.1-1ΜM,单位:5MG/ML;SILICA GEL 40;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:3-4ΜM,单位:10MG/ML;二氧化硅,轻质AR;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:1-2ΜM,单位:10MG/ML;CELITE(R) 521;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:2-3ΜM,单位:10MG/ML;单分散二氧化硅微球;TLC-SILICA GEL 60 GF254;SILICIC ACID PRECIPITATED, 99%;SILICAGEL LC100A;SILICAGEL 60A;DRYING AGENT SILICA GEL PS;亲水气相纳米二氧化硅HYDROPHILIC-200B型,99.8%,比表面积（BET）：200M2/G;NANO FUMED SILICA;CELATOM;DESICCANT;SILICA GEL 60 H;亲水性气相纳米二氧化硅HYDR,99.8%,比表面积（BET）：300M2/G;SILICA GEL DESICCANT, INDICATING;LUDOX(R) TMA COLLOIDAL SILICA;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:0.1-1ΜM,单位:5MG/ML;SILICA GEL SELF INDICATING BLUE;疏水性气相纳米二氧化硅HYDROPHOBIC-115型;SILICA WOOL;DIATOMITE;SILICA GEL RUBIN;气相二氧化硅;SILICA, FUMED;SILICA GEL 100;FUMED SILICA;SAND;DESICCANT NON-INDICATING;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:3-4ΜM,单位:10MG/ML;二氧化硅(石英);SLC CORE-SHELL MONODISPERSED MAGNETIC SILICA MICROSPHERES;SILICON DIOXIDE BEADS;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:3-4ΜM,单位:10MG/ML;SILICA 60;PRECIPITATED SILICIC ACID;单分散二氧化硅微球,粒径:500NM,2.5% W/V;WHITE QUARTZ;PHOSPHOROUS SILICA;LICHROSORB(R) SI 60;SYTON(R) HT-50;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:0.1-1ΜM,单位:5MG/ML;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:4-5ΜM,单位10MG/ML;高纯度硅胶;SILICA SAND;THERMAL ANALYSIS-SILICON DIOXIDE;SILICON(IV) OXIDE;二氧化硅,SP;SILICA GEL PURIFIED ON TLC-PET-FOILS;SLC 核壳式二氧化硅磁性微球,;COLLOIDAL SILICA;LUDOX(R) CL COLLOIDAL SILICA;LUDOX(R) LS COLLOIDAL SILICA;单分散二氧化硅微球,粒径:10.0ΜM,2.5% W/V;SIO2/SI;SILICAGEL 60A 60-200U;单分散二氧化硅微球,粒径:3.0ΜM,2.5% W/V;疏水气相纳米二氧化硅HYDRO,99.8%,比表面积（BET）：170M2/G;单分散二氧化硅微球,粒径:4.0ΜM,2.5% W/V;单分散氨基二氧化硅微球,粒径:300NM,2.5% W/V;LUDOX(R) HS-30 COLLOIDAL SILICA;LUDOX(R) SM COLLOIDAL SILICA;SILICA NANOSPRINGS COATED WITH ZINC OXIDE AND GROWN ON GLASS SLIDE SUBSTRATE (2.5 X 7.5CM);二氧化硅(无定形的二氧化硅);单分散氨基二氧化硅微球;BLUE GEL DESICCANT;LUDOX(R) HS-40 COLLODIAL SILICA;二氧化硅晶体,99.999%,直径2MM,高度10MM,圆柱体状;SILICA NO 2;二氧化硅;CAB-O-SIL M-5;SILICA, MESOSTRUCTURED;SILICON DIOXIDE SOLUTION;SILICA FUME;亲水型气相纳米二氧化硅HYDROPHILIC-300型;SILICA GEL WHITE;疏水气相纳米二氧化硅HYDROPHOBIC-230型;单分散羧基二氧化硅微球;疏水气相纳米二氧化硅HYDRO,99.8%,比表面积（BET）：120M2/G;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:2-3ΜM,单位:10MG/ML;亲水性气相纳米二氧化硅HYDROPHILIC-380型;LICHROPREP(R) SI 60;SI 60;SILICA, HYDRATE(8CI,9CI);SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:2-3ΜM,单位:10MG/ML;石英片;COLLOIDAL SILICA (AMMONIUM TYPE);LICHROPREP(R) SI 100;BEADS BASED ON SILICON DIOXIDE, MICROSIZE;SILICA GLASS;SILICA GEL DESICCANT;SILICA NO 1;纳米二氧化硅,99.5%,15±5NM;SILICA NANOSPRINGS GROWN ON FIBER GLASS SUBSTRATE (3.5 X 8CM);AMORPHOUS SILICON;疏水气相纳米二氧化硅HYDROPHOBIC-100型;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:0.1-1ΜM,单位:5MG/ML;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:0.1-1ΜM,单位:5MG/ML;石英屑;SILICA GEL 60;SILICA,FUMED;二氧化硅/纳米二氧化硅;SILICA GEL;AMORPHOUS SILICA;单分散二氧化硅微球,粒径:2.0ΜM,2.5% W/V;氧化硅;单分散氨基二氧化硅微球,粒径:3.0ΜM,2.5% W/V;二氧化硅晶体;CELITE 546;SLE 包埋式二氧化硅磁性微球,;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:3-4ΜM,单位:10MG/ML;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:3-4ΜM,单位:10MG/ML;石英砂,AR,6-10目或2-3MM;SILICA GEL ON TLC PET-FOILS;LUDOX(R) TM-50 COLLOIDAL SILICA;LUDOX(R) AS-40 COLLOIDAL SILICA;硅胶;CELITE(R) STANDARD SUPER-CEL(R);SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:1-2ΜM,单位:10MG/ML;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:3-4ΜM,单位:10MG/ML;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-EPOXY,粒径:1-2ΜM,单位:10MG/ML;DIATOMACEOUS EARTH;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:2-3ΜM,单位:10MG/ML;KIESELGUHR;单分散二氧化硅微球,粒径:1ΜM,2.5% W/V;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:2-3ΜM,单位:10MG/ML;NANO SILICA GEL ADAMANT(TM) ON TLC PLATES;单分散二氧化硅微球,粒径:300NM,2.5% W/V;SILICA PREPARATION;LICHROSORB(R) SI 100;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:4-5ΜM,单位:10MG/ML;二氧化硅晶体,1-3MM 颗粒,99.999%;LUDOX(R) AM COLLOIDAL SILICA;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:1-2ΜM,单位:10MG/ML;LICHROSORB(R) 60;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:1-2ΜM,单位:10MG/ML;SLE 包埋式二氧化硅磁性微球;SILICA GEL 60 ADAMANT(TM) ON TLC PLATES;SILICA GEL 60 SILANIZED;KIESELGUHR, SODA ASH FLUX-CALCINED;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-SIOH,粒径:4-5ΜM,单位:10MG/ML;SILICAGEL LC60A;二氧化硅,99.99% METALS BASIS,粒径:10ΜM;二氧化硅标准溶液,100MG/L,基体:0.05%NA2CO3;亲水性气相纳米二氧化硅HYDROPHILIC-200型;POLY TLC PLATES: SILICA WITH FLUORESCENCE;MONODISPERESED SILICA MICROPHERES;高纯度硅胶,40-63ΜM ,60Å亲水性气相纳米二氧化硅HYDROPHILIC-150型,99.8%,比表面积（BET）：150M2/G;NANO SIO2;SILICA GEL 60 G;TLC SILICA GEL 60 H;SLC 核壳式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:1-2ΜM,单位:10MG/ML;SILICON OXIDE;SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-COOH,粒径:4-5ΜM,单位:10MG/ML;SILICA GEL NANO ADAMANT(TM) ON TLC PLATES;SILICA;MAGPREP(R) SILICA;FUMED COLLOIDAL SILICA;疏水性气相纳米二氧化硅HYDR,99.8%,比表面积（BET）：115M2/G;SILICON(IV) OXIDE, FUMED ACTIVITED;QUARTZ;热分析标准物质（二氧化硅）;亲水型气相纳米二氧化硅HYDROPHILIC-200型;二氧化硅,99.99% METALS BASIS,粒径:5ΜM;二氧化硅(高分散的二氧化硅);SILICA, COLLOIDAL;CRISTOBALITE;SLC 核壳式二氧化硅磁性微球;QUARTZ FINE;MICRO PARTICLES BASED ON SILICON DIOXIDE;CAB-O-SIL(R) M-5;SILICON DIOXIDE;疏水型气相纳米二氧化硅HYDROPHOBIC-170型;QUARTZ CHIPS;LUDOX(R) TM-40 COLLOIDAL SILICA;亲水性气相纳米二氧化硅HYDROPHILIC-150型;单分散二氧化硅微球,粒径:700NM,2.5% W/V;SILICA GEL ON TLC AL FOILS;石英砂,AR,8-16目或1-2MM;SILICA GEL PS DRYING AGENT;SILICA GEL ON TLC PLATES;LUDOX(R) AS-30 COLLOIDAL SILICA;SILICA NANOSPRINGS COATED WITH TITANIUM DIOXIDE AND GROWN ON ALUMINUM FOIL SUBSTRATE (3.5 X 8CM);SLE 包埋式二氧化硅磁性微球,基质:SIO2,表面基团:-NH2,粒径:2-3ΜM,单位:10MG/ML

CCD:CCD00033126

CAS:25583-20-4

MDL:MFCD00049596

MF / MW:N Ti / 61.874

Synonyms:TIN B;TIN A;氮化钛;TITANIUM NITRIDE;纳米氮化钛;TIN C;TITANIUM(III)NITRIDE