基本信息 |
|
| 产品名称： | 钛,粉状 |
| CAS： | 7440-32-6 ;16962-40-6 |
| 中文同义词： | 钛,粉状 ; 纳米钛粉 ; 钛标准溶液 ; 钛粉 ; 氟钛酸铵 ; 水质钛标样 |
| 英文同义词： | TITANIUM PLASMA STANDARD ; AMMONIUM HEXAFLUOROTITANATE (IV), MIN. 98% ; TITANIUM GAUZE ; TITANIUM ICP STANDARD ; TITANIUM IN HYDROCARBON OIL ; TITANIUM (O, N) ; TITANIUM SINGLE ELEMENT STANDARD ; TITANIUM AA/ICP CALIBRATION/CHECK STANDARD ; TITANIUM (H) ; TITANIUM AA SINGLE ELEMENT STANDARD ; TITANIUM STANDARD FOR WATER ANALYSIS ; TITANIUM STANDARD ; TITANIUM ICP/DCP STANDARD ; TITANIUM, OIL BASED STANDARD ; TITANIUM SPONGE ; TITANIUM ATOMIC ABSORPTION STANDARD ; TITANUM ; TITANIUM SINGLE ELEMENT PLASMA STANDARD ; TITANIUM (IMPURITIES) ; TITANIUM METAL ; TITANIUM |
| MDL号： | MFCD00011264 |
| 氢键受体数量： | 0 |
| 氢键供体数量： | 0 |
| Smile： | [Ti] |
| InChi： | InChI=1S/Ti |
| InChiKey： | InChIKey=RTAQQCXQSZGOHL-UHFFFAOYSA-N |
性质 |
|
| 熔点： | 1660 DEG C(LIT)/1660 °C/1660 °C/1720℃ |
| 沸点： | 3287 DEG C(LIT)/3287 °C/3287 °C/3000℃ |
| 密度： | 4.5g/mLat25°C(lit.) |
| 物理性质： | AUTOIGNITION TEMPERATURE: 860 DEG F RESISTIVITY: 42.0 MUOMEGA-CM 20 DEG C |
| 注解： | APPLICATION: SPUTTERING IS A PROCESS WHEREBY ATOMS ARE EJECTED FROM A SOLID TARGET MATERIAL DUE TO BOMBARDMENT OF THE TARGET BY ENERGETIC PARTICLES. THE EXTREME MINIATURIZATION OF COMPONENTS IN THE SEMICONDUCTOR AND ELECTRONICS INDUSTRY REQUIRES HIGH PURITY SPUTTERING TARGETS FOR THIN FILM DEPOSITION ASSAY METHOD: TRACE METALS BASIS DIAMETER X THICKNESS: 2.00 IN. X 0.25 IN |
| 浓度： | inmineraloil |
安全信息 |
|
| 符号： |
GHS02
|
| 信号词： | Danger |
| 危险声明： | H250 |
| 警示性声明： | P222-P231-P422 |
| 危害码： | F |
| 风险声明： | R:17 |
| 安全声明： | S:S16;S33;S43E |
| WGK德国： | 1 |
| 闪点： | 237℃/237℃/237℃ |
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