basic_info |
|
| Product_Name： | 三(2,2,6,6-四甲基-3,5-庚二酮酸)钇(III) |
| CAS： | 15632-39-0 |
| 中文同义词： | (2,2,6,6-四甲基-3,5-庚二酮酸)钇 ; 三(2,2,6,6-四甲基-3,5-庚二酮酸)钇(III) ; 三(2,2,6,6-四甲基-3,5-庚二酮酸)钇 |
| EnglishSynonyms： | YTTRIUM(III)-DPM ; YTTRIUM 2,2,6,6-TETRAMETHYLHEPTANEDIONATE ; YTTRIUM 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE ; Y(TMHD)3 ; YTTRIUM (III) TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE) ; YTTRIUM (III) 2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE ; YTTRIUM TRIS(DIPIVALOYLMETHANATE) ; TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)YTTRIUM ; YTTRIUM-THD ; YTTRIUM(Ⅲ) TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE) ; TRIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)YTTRIUM(III) |
| pro_mdlNumber： | MFCD00015713 |
| pro_acceptors： | 6 |
| pro_donors： | 0 |
| pro_smile： | CC(C)(C)/C(=C/C(=O)C(C)(C)C)/O[Y](O/C(=C\C(=O)C(C)(C)C)/C(C)(C)C)O/C(=C\C(=O)C(C)(C)C)/C(C)(C)C |
| InChi： | InChI=1S/3C11H20O2.Y/c3*1-10(2,3)8(12)7-9(13)11(4,5)6;/h3*7,12H,1-6H3;/q;;;+3/p-3/b3*8-7-; |
| InChiKey： | InChIKey=PPRRRPCEDUWEHL-LWTKGLMZSA-K |
property |
|
| MeltingPoint： | 173-175 DEG C/173-175 °C |
| Boiling_Point： | SUBL 95 DEG C/0.05MM |
| Comments： | APPLICATION: A PRECURSOR FOR THE FORMATION OF THIN FILMS OF YTTRIA BY CECVD. THE FILMS HAVE POTENTIAL APPLICATIONS AS ELECTRONIC INSULATORS, COATINGS, REACTION BARRIERS AND SUPERCONDUCTING MATERIALS ASSAY METHOD: TRACE METALS BASIS FORM: SOLID UNSPSC: 12352300 WGK: 3 |
secure_info |
|
| secure_symbol： |
GHS07
|
| secure_signal_word： | Warning |
| secure_risk_stmt： | H302-H312-H315-H319-H332-H335 |
| secure_cautionary_stmt： | P261-P280-P305 + P351 + P338 |
| secure_damage_code： | Xn |
| secure_risk_disclosure_stmt： | R:20/21/22-36/37/38 |
| secure_security_stmt： | S:26-37/39 |
| secure_wgk_germany： | 3 |
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