basic_info |
|
| Product_Name： | 二乙基硅烷 |
| CAS： | 542-91-6 |
| 中文同义词： | 二乙基硅烷 |
| EnglishSynonyms： | DIETHYLSILANE |
| pro_mdlNumber： | MFCD00039877 |
| pro_acceptors： | 0 |
| pro_donors： | 0 |
| pro_smile： | CC[SiH2]CC |
| InChi： | InChI=1S/C4H12Si/c1-3-5-4-2/h3-5H2,1-2H3 |
| InChiKey： | InChIKey=UCXUKTLCVSGCNR-UHFFFAOYSA-N |
property |
|
| Boiling_Point： | MP: -132 DEG C |
| Density： | 0.681g/mLat25°C(lit.) |
| PhysicalProperty： | FLASHPOINT: -20 DEG C FLASHPOINT: -4 DEG F REFRACTIVE INDEX: N20/D 1.391(LIT) |
| Comments： | APPLICATION: REAGENT EMPLOYED IN THE CHEMICAL VAPOR DEPOSITION OF SIO2 FOR MICROELECTRONICS RIDADR: UN 1993 3/PG 2 UNSPSC: 12352103 WGK: 1 |
secure_info |
|
| secure_symbol： |
GHS02
|
| secure_signal_word： | Danger |
| secure_risk_stmt： | H225 |
| secure_cautionary_stmt： | P210 |
| secure_damage_code： | F |
| secure_risk_disclosure_stmt： | R:11 |
| secure_security_stmt： | S:16 |
| secure_wgk_germany： | 1 |
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