basic_info |
|
| Product_Name： | 三(二甲基酰胺基)铝 |
| CAS： | 32093-39-3 |
| 中文同义词： | 三(二甲基酰胺基)铝 |
| EnglishSynonyms： | HEXAKISDIMETHYLAMIDE DIALUMINUM ; TRIS(DIMETHYLAMINO)ALUMINUM(III) ; BIS[MU-(DIMETHYLAMINATO)]TETRAKIS(N-METHYLMETHANAMINATO)DIALUMINUM ; ALUMINUM DIMETHYLAMIDE ; BIS(MU-DIMETHYLAMINO)TETRAKIS(DIMETHYLAMINO)DIALUMINUM ; TRIS(DIMETHYLAMINO)ALUMINUM DIMER ; TRIS(DIMETHYLAMIDO)ALUMINUM(III) |
| pro_mdlNumber： | MFCD00269811 |
| pro_acceptors： | 3 |
| pro_donors： | 0 |
| pro_smile： | CN(C)[Al](N(C)C)N(C)C.CN(C)[Al](N(C)C)N(C)C |
| InChi： | InChI=1S/6C2H6N.2Al/c6*1-3-2;;/h6*1-2H3;;/q6*-1;2*+3 |
| InChiKey： | InChIKey=JGZUJELGSMSOID-UHFFFAOYSA-N |
property |
|
| MeltingPoint： | 82-84 DEG C(LIT) |
| Density： | DENSITY: 0.865 G/ML AT 25 DEG C(LIT) |
| PhysicalProperty： | FLASHPOINT: 21 DEG C FLASHPOINT: 69.8 DEG F |
| Comments： | APPLICATION: PRECURSOR TO ALUMINUM NITRIDE (ALN) THIN FILMS BY ORGANOMETALLIC CHEMICAL VAPOR DEPOSITION (OMCVD) FORM: SOLID GENERAL DESCRIPTION: ATOMIC NUMBER OF BASE MATERIAL: 13 ALUMINUM RIDADR: UN 3131 4.3/PG 1 UNSPSC: 12352103 WGK: 3 |
secure_info |
|
* If the product has intellectual property rights, a license granted is must or contact us.
2010-2025 © Chemical Cloud Database. ALL Rights Reserved.浙ICP备11020424号-1
浙公网安备 33010802004002号
English