基本信息 |
|
| 产品名称： | FMOC-CYS(TRT)-WANG RESIN |
| CAS： | 9003-70-7 |
| 英文同义词： | FMOC-CYS(TRT)-WANG RESIN ; FMOC-CYS(TRT)-HMP-TENTAGEL RESIN ; FMOC-CYS(TRT)-2-CL-TRT RESIN ; FMOC-L-CYS(TRT)-WANG ; TENTAGEL(TM) S PHB-CYS(TRT)FMOC ; FMOC-L-CYS(TRT)-4-METHYLBENZHYDRYL RESIN ; TENTAGEL(TM) S TRT-CYS(TRT)FMOC ; FMOC-CYS(TRT)-HMP RESIN ; FMOC-L-CYS(TRT)-WANG TENTAGEL S ; NALPHA-FMOC-S-TRITYL-L-CYSTEINE 4-BENZYLOXYBENZYL ESTER POLYMER-BOUND ; N-ALPHA-FMOC-S-TRITYL-L-CYSTEINE-HMP-TENTAGEL RESIN ; N-ALPHA-FMOC-S-TRITYL-L-CYSTEINE-WANG RESIN ; FMOC-CYS(TRT)-WANG RESIN LL ; N-ALPHA-FMOC-S-TRITYL-L-CYSTEINE-HMP RESIN ; NALPHA-FMOC-S-TRITYL-L-CYSTEINE 4-[POLY(ETHYLENOXY)]BENZYL ESTER POLYMER-BOUND ; FMOC-L-CYS(TRT)-WANG TG ; FMOC-L-CYS(TRT)-4-METHOXYBENZHYDRYL RESIN ; FMOC-CYS(TRT)-NOVASYN(R) TGT ; FMOC-L-CYS(TRT)-WANG RESIN ; FMOC-L-CYS(S-TRT)-WANG RESIN ; FMOC-L-CYS(S-TRT)-WANG TENTAGEL S ; FMOC-CYS(TRT)-RINK AMIDE-MBHA RESIN ; FMOC-CYS(TRT)-RINK RESIN ; FMOC-CYS(TRT)-NOVASYN(R) TGA ; FMOC-L-CYS(TRT)-RINK MBHA RESIN ; PS-PHB-CYS(TRT)-FMOC ; FMOC-L-CYS(TRT)-4MEOBH RESIN ; FMOC-S-TRITYL-L-CYSTEINE-2-CHLOROTRITYL RESIN ; FMOC-CYS(TRT)-WANG PS RESIN ; FMOC-CYS(TRT)-P-ALKOXYBENZYL ALCOHOL RESIN ; FMOC-L-CYS(TRT)-4MBH RESIN ; FMOC-S-TRITYL-L-CYSTEINE 4-ALKOXYBENZYL ALCOHOL RESIN ; FMOC-CYS(TRT)-RESIN ; FMOC-L-CYS(TRT)-2-CHLOROTRITYL RESIN ; FMOC-L-CYS(TRT)-RINKAMIDE MBHA RESIN ; NALPHA-FMOC-S-TRITYL-L-CYSTEINE 4-[POLY(OXYETHYLENE)CARBAMOYL]TRITYL ESTER POLYMER-BOUND ; N-ALPHA-FMOC-S-TRITYL-L-CYSTEINE-RINK AMIDE-MBHA RESIN ; N-ALPHA-(9-FLUORENYLMETHOXYCARBONYL)-S-TRITYL-L-CYSTEINE P-BENZYLOXY-BENZYL ALCOHOL RESIN |
| MDL号： | MFCD00801374 |
| 氢键受体数量： | 4 |
| 氢键供体数量： | 1 |
| Smile： | *C(=O)[C@H](CSC(c1ccccc1)(c2ccccc2)c3ccccc3)NC(=O)OCC4c5ccccc5-c6c4cccc6 |
| InChiKey： | InChIKey=null |
性质 |
|
| 注解： | PARTICLE SIZE: 37-75 MICRONS STORAGE TEMPERATURE: 2-8 DEG C UNSPSC: 12352100 WGK: 3 |
| 信息： | EXTENT OF LABELING: APPROX 0.7 MMOL/G LOADING |
安全信息 |
|
| WGK德国： | 3 |
* If the product has intellectual property rights, a license granted is must or contact us.
2010-2025 © Chemical Cloud Database. ALL Rights Reserved.浙ICP备11020424号-1
浙公网安备 33010802004002号
English
