
CCD:CCD00357433
CAS:945414-97-1
MDL:MFCD03093871
MF / MW:C76 H109 N21 O15 / 1556.83
同义词:490 MMP FRET SUBSTRATE V;NBD-APLPLA-NVA-WK(DMC)-NH2;NBD-RPKPLA-NVA-WK(DMC)-NH2;NBD-ARG-PRO-LYS-PRO-LEU-ALA-NVA-TRP-LYS(DMC)-NH2;MMP-3 SUBSTRATE II, FLUOROGENIC
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